PO.ET02.07 · 实验与分子治疗

基于 ICH 指南制定适当残留溶剂标准的科学依据

Scientific justification for setting up an appropriate specification of residual solvent based on ICH guideline

海报缩略图:基于 ICH 指南制定适当残留溶剂标准的科学依据
编号 290 展板 8 时间 4/19 02:00–05:00 区域 Section 13 主讲 Lynn Wang
分会场 Innovative Therapeutic Modalities and Translational Platforms
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作者与单位 Authors & Affiliations

Zhanxiang Sun1, Jianqiang Li2, Lynn Wang2, Xudong Wei3

1Payload-Linker Department, WuXi XDC, Cranbury, NJ,2Payload-linker Department, WuXi XDC, Cranbury, NJ,3WuXi XDC, Cranbury, NJ

摘要 Abstract

中文摘要
payload-linker(有效载荷-连接子)中存在的残留溶剂是抗体药物偶联物(ADC)生产中的关键中间体,在工艺开发过程中可能难以完全去除。这可能导致 payload-linker 阶段的残留水平超过 ICH Q3 指南的规定。为解决这一问题,XDC 综合考虑了 ICH Q3C(R8) 的毒理学数据、工艺清除能力、临床安全要求以及偶联反应条件,进行了全面的科学评估。基于该评估,提出了有科学依据的残留溶剂限度扩展方案,以确保产品安全性和工艺可行性。假设某些溶剂在生产和纯化过程中无法完全消除,则建立了一个论证框架来计算每种残留溶剂的适当标准限度。该方法结合安全系数和监管指南,以确立科学合理的限度。其成果为完全去除在技术上具有挑战性的情况提供了实用的解决方案,在确保符合安全标准的同时支持高效的 ADC 开发。
查看英文原文 English abstract
Residual solvents present in payload-linkers, critical intermediates in antibody-drug conjugate (ADC) manufacturing, can be challenging to fully remove during process development. This may lead to levels exceeding ICH Q3 guidelines at the payload-linker stage. To address this, XDC conducted a comprehensive scientific assessment considering toxicological data from ICH Q3C(R8), process clearance capabilities, clinical safety requirements, and conjugation reaction conditions. Based on this evaluation, scientifically justified extensions of residual solvent limits were proposed to ensure both product safety and process feasibility. Assuming certain solvents cannot be completely eliminated during manufacturing and purification, a justification framework was developed to calculate appropriate specification limits for each residual solvent. This approach incorporates safety factors and regulatory guidance to establish scientifically sound limits. The outcome provides a practical solution for cases where complete removal is technically challenging, ensuring compliance with safety standards while supporting efficient ADC development.
利益披露 Disclosure
Z. Sun, WuXi XDC Employment. J. Li, WuXi XDC Employment. L. Wang, WuXi XDC Employment. X. Wei, WuXi XDC Employment.

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